Week 4
Task 9- Comparison
During this particle project, the percentage of high-k
dielectric material in MOS capacitor was 50%. This specific percentage leads
essence understanding on the function of using different percentage high-k
dielectric in MOS capacitor. The determined oxide relative permittivity in
70%Hf and 30%Hf are approximately 11 and 5 respectively. By comparison of these result,
using high percentage of Hf, high-k material, causes bigger relative
permittivity. However leakage current conversely is increased due to high
charge density. The percentage of high-k dielectric therefore needs to be
justifying with regarding to correlation between permittivity and charge
density.
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